Flat-Bed Photoreactors
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Flat-Bed Photoreactors

for commercial production

Flatbed flow-through photoreactors are specialized devices for carrying out chemical reactions under the influence of light. They consist of a flat, transparent chamber through which liquids or gases flow continuously. The reaction chamber is designed to ensure uniform irradiation by UV or visible light. These photoreactors are often used in photocatalysis, organic synthesis and water treatment. Their flat geometry ensures a high contact surface between reactants, light and any catalysts used. The design enables precise control of reaction parameters such as flow rate and light intensity. Flatbed flow-through photoreactors are efficient and scalable, allowing them to be used in both research and industrial processes. They promote sustainable processes as they often use mild conditions and renewable light sources. The continuous mode of operation minimizes by-products and optimizes product purity. Their versatility makes them a key technology in modern chemistry and environmental technology.

Built the Flat-Bed Photoreactor that fits you needs.

Grafic plate flow photoreactors

Choose a flat LED module

The new flow photoreactors, paired with high-power LED modules, enables seamless scaling from feasibility to commercial production, handling several metric tons annually.

Its design facilitates single-technology scale-up with low pressure drop, enabling high-throughput operations. Enhanced turbulence, mass, and heat transfer, allowing prolonged irradiation without recirculation.

Pilot sizes of these reactors are not required, as seamless scaling from laboratory to large-scale production is possible. For pilot installations, however, ATEX or NEC 500 certified lamp systems are used, which are available with outputs of up to 1.6 kW per reactor. Complete skids are offered for this purpose, which have been developed as turnkey multi-purpose “enabeling-technology” skids.

In industrial production, the reactors are connected in cascades and production capacities are achieved by numbering up. This enables seamless process development from laboratory to industrial scale without scaling risks.

Flat-bed LED for flow reactors

Technical Specifications

Irradiation wavelengths

365 / 385 / 395 / 405 / 420 / 460 / 525/ 592 / 625nm

Power Input     

Up to 1.6 kW

Light Source Certifications  

ATEX, NEC 500

Applications

Peschl Flat-Bed Photoreactors are applied in industrial-scale production processes including, but not limited to:

  • API and intermediate synthesis (e.g. Iribotecan by Cis-Trans Isomerization and Artemisinin by Singlet Oxygen Reaction)
  • Mercaptan synthesis (e.g. Cyclohexylthiol via H2S addition)
  • Fragerances (e.g. Rose Oxyde via Singlet Oxygen Reaction)

Get your chemistry scaled up with the new flat-bed photoreactors!

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Process specific plate flow reactors

 

XFR – Intensified mixing reactors

The XFR 200 is the latest generation of a flow photoreactor. Designed, manufactured and sourced from our respected flow technology partner in Asia, this low profile flow reactor features a split and recombinant serpentine microchannel. Thanks to its plate-like design, it can accommodate a wide range of reactor volumes, making it ideal for process development up to production scale. The proprietary space-filling design ensures maximum surface area efficiency and optimizes the surface-to-volume ratio with minimal space requirements.
The flat flow reactor can be operated in both stationary and oscillating mode. The latter ensures excellent mixing regardless of the required residence time and is therefore ideal for reactions with precipitation or slurry phases. Easy disassembly of the reactor for cleaning validation ensures that GMP guidelines are met. The XFR 200 flow reactor is a proven solution that represents a significant advance in scalability, efficiency and sustainability for the pharmaceutical and fine chemical industries.

plate flow reactor

Get informed about other products of Halen Technologies – our partner in flow photochemistry!

Halen Technologies

Features

  • Versatile and Robust
  • Available in versatile materials and engineered to handle challenging flow processes, incl. slurry reactions and emulsions
  • Broad Volume Range
  • From approx. 12 up to 200 mL
  • Long Residence Time Reactions
  • Mixing independent of net flow rate
  • Proprietary LED technology
  • Experience the power of commercial flow photochemistry
  • Fully Compliant
  • Meets GMP, ATEX, and NEC500 standards

Technical Specifications of XFR 200

Reactor Volume

12 – 200 mL

Flow Range

0.01 – 60 L/h

Pressure Rating

10 barg

Temperature Range

-20 to 200 °C

Heat Exchanger

Build-in Heat Transfer Fluid System

Available Material

SS 316L, Hastelloy C276, Tantalized

Window Material

Borosilicate, Quartz

Gasket Compliance

FDA, REACH, RoHS, USP

Applications

  • (Metalla)photoredox Cross-couplings
  • Fluoroalkylations
  • Halogenations
  • C-H Functionalizations
  • Cycloadditions

 

 

Thin Film Photoreactor TFR

The TFR 200 is specifically developed for photoreactions involving species with high absorption coefficients. These processes exhibit low transmittance, as photons are absorbed almost instantly at the exposed surface. With our TFR 200, we offer high-absorption photochemistry at commercial scale. The reactors are designed to optimize the irradiation of the process stream by generating a thin film that is precisely tailored to the absorption profile. This safeguards efficient irradiation of the entire process liquid as it flows through the film, maximizing photon utilization and reaction efficiency.

Equipped with the proprietary high-power flat LED technology developed by Peschl Ultraviolet GmbH, these flameproof flow photoreactors are designed for commercial production. The photonic energy generated by the LEDs in combination with the small volume of the flow reactor requires detailed modeling to secure the safe operation. We cooperate with a specialized party for CFD (Computational Fluid Dynamics) simulations on all our plate-type flow reactors.

Our reactors are engineered with high-pressure rating and minimal pressure drop. For production, multiple photoreactors can be cascaded into turnkey flameproof plants. With the TFR 200 reactors, photochemical reactions involving highly absorbing substrates can be successfully scaled to commercial production.

Thin Film Flow Photoreactor

High-Absorption Photochemistry

Features

  •  Designed for High Absorbing Processes
  • Adaptive Thin Film Layer for Optimal Irradiation
  • CFD-Driven & Flameproof Reactor Design
  • Excellent Cleanability & Low Dead Volume
  • Suitable for Commerical-scale Production

Applications

  • API & intermediate synthesis with high abs. coefficient
  • Photooxidations implying radical intermediates
    (e.g. AOP)
  • Steroid-hormone synthesis
    (e.g., production of Vitamin D derivatives)
  • Production of vitamins (e.g., Vitamin A)
  • Fluoroalkylations
    (e.g., Trifluoromethylation with the Langlois reagent)

Technical Specifications of TFR 200

Design pressure

Up to 16 barg

Temperature range

-20 to 100°C

Reactor volume

1 – 10 ml per reactor cell

Production capacity

up to MT/year

Residence time range

<10 sec – 30 min

Material of construction

SS 316 or Hastelloy C

Hydrodynamic profile

Thin film laminar flow

Mode of Operation

Continuous

Heterogen. reactions

NO

Heat exchanger

Build-in heat transfer fluid system

Amount of lamps

1 lamp per reactor cell

LED power consumption

Up to 1600 W per lamp

Available Wavelength

365 / 385 / 395 / 405 / 420 / 460 / 525/ 592 / 625 nm

Optical path

<1 mm

Flameproof

ATEX & NEC 500
(Class 1 / Div 2)

Temperature Class

T4 (Tmax 135°C)

Regulatory Compliance

GMP, FDA, REACH, RoHS, USP, PED

Control & Automation

Local & DCS operation

Ready to discover how our flow-through photoreactor can enhance your process?

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Any questions?

Please ask us

    Davide_web_quer_72dpi_V2

    Davide Onesti

    Customer Service,
    Purchase & Sales

    service@peschl-ultraviolet.com

    +49 (0) 6131 143845-0